1.

国際会議録
国際会議録
1. Computationally efficient ion implantation damage model: modified Kinchin-Pease model
Wang,G. ; Tian,S. ; Morris,M.F. ; Morris,S.J. ; Obradovic,B.J. ; Balamurugan,G. ; Tasch,A.F.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.324-333,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
2.

国際会議録
国際会議録
2. Low-energy model for ion implantation of arsenic and boron into (100) single-crystal silicon
Obradovic,B.J. ; Morris,S.J. ; Morris,M.F. ; Tian,S. ; Wang,G. ; Beardmore,K. ; Snell,C. ; Jackson,J. ; Baummann,S. ; Tasch,A.F.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.342-353,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
3.

国際会議録
国際会議録
3. Adjusting and testing technology of a 20-m parallel light tube
Tian,S. ; Miao,Y. ; Zhou,S. ; Li,Y.
出版情報: Advanced optical manufacturing and testing technology : 1-3 November 2000, Chengdu, China.  pp.624-627,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4231
4.

国際会議録
国際会議録
4. Experimental verification of a new physically based low-energy (<5 keV) ion implant model
Obradovic,B.J. ; Morris,S.J. ; Morris,M.F. ; Tian,S. ; Wang,G. ; Beardmore,K. ; Snell,C.M. ; Jackson,J. ; Baumann,S. ; Tasch,A.F.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.301-312,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506