1.

国際会議録
国際会議録
1. Call for an industry standard for pattern transfer models for usage in OPC and design for manufacturability [6156-07]
Roessler, T. ; Grimm, W. ; Thiele, J.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615607-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. Annotated layout optimization [6156-05]
Thiele, J. ; Kahle, R.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615605-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
3.

国際会議録
国際会議録
3. Geometrical analysis of product layout as a powerful tool for DFM(Invited Paper)
Roessler, T. ; Thiele, J.
出版情報: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.150-160,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5756
4.

国際会議録
国際会議録
4. Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node
Winkler, T. ; Dettmann, W. ; Hennig, M. ; Koestler, W. ; Moukara, M. ; Thiele, J. ; Zeiler, K.
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.476-487,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
5.

国際会議録
国際会議録
5. Complementary dipole exposure solutions at 0.29 k1
Heumann, J. ; Schramm, J. ; Birnstein, A. ; Park, K. T. ; Witte, T. ; Morgana, N. ; Hennig, M. ; Pforr, R. ; Thiele, J. ; Schmidt, N. ; Aquino, C.
出版情報: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.327-338,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5754
6.

国際会議録
国際会議録
6. Vitamin E and the metabolic antioxidant network
Packer, L. ; Podda, M. ; Kitazawa, M. ; Thiele, J. ; Saliou, C. ; Witt, E. ; Traber, M. G.
出版情報: Molecular mechanisms of signalling and membrane transport.  pp.281-304,  1997.  Berlin.  Springer-Verlag
シリーズ名: NATO ASI series. Series H, Cell biology
シリーズ巻号: 101
7.

国際会議録
国際会議録
7. Improved manufacturability by OPC based on defocus data
Thiele, J. ; Anke, I. ; Haffner, H. ; Semmler, A.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.135-143,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
8.

テクニカルペーパー
テクニカルペーパー
8. Cylinder Heads for High Power Gasoline Engines-Thermomechanical Fatigue Life Prediction.
Thalmair, S. ; Thiele, J. ; Fischersworring-Bunk, A. ; Ehart, R. ; Guillou, M.
出版情報: 2006 SAE world congress : technical paper.  2006.  Warrendale, Penn..  Society of Automotive Engineers
シリーズ名: Society of Automotive Engineers technical paper series
シリーズ巻号: 2006
9.

国際会議録
国際会議録
9. Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation
Pforr, R. ; Dettmann, W. ; Eisenhut, M. ; Hennig, M. ; Hofmann, D. ; Thiele, J. ; Thielscher, G.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.178-187,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
10.

国際会議録
国際会議録
10. Simulation based OPC for contact pattern using 193 nm lithography [5853-63]
Keck, M. ; Bodendorf, C. ; Thiele, J. ; Gomez, A. L. ; Tseng, Y.-C. ; Huang, T.-Y.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.776-784,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853