1.

国際会議録
国際会議録
1. DEFECTS RELATED TO MIXING BEHAVIOR OF HIGHLY SILICON-DOPED GaAs/A1As SUPERLATTICES
Theodore, N. D. ; Carter, C. B. ; Mei, P. ; Schwarz, S.A. ; Harbison, J. P. ; Venkatesan, T.
出版情報: Advances in materials, processing, and devices in III-V compound semiconductors.  pp.139-144,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 144
2.

国際会議録
国際会議録
2. Indluence of Interfacial Copper on the Ti-SiO2 Reaction during Nitridatin of Cu-Ti Films
Adams, Daniel ; Alford, T. L. ; Theodore, N. D. ; Laursen, T. ; Russell, S. W. ; Kim, M. J.
出版情報: Thermodynamics and kinetics of phase transformations : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.631-,  1996.  Pittsburgh, Penn..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 398
3.

国際会議録
国際会議録
3. EFFECTIVENESS OF NITRIDE DIFFUSION BARRIERS IN A SELF-ENCAPSULATED COPPER-BASED METALLIZATION
Adams, D. ; Spreitzer, R. L. ; Russell, S. W. ; Theodore, N. D. ; Alford, T. L. ; Mayer, J. W.
出版情報: Advanced metallization for devices and circuits--science, technology, and manufacturability : symposium held April 4-8, 1994, San Francisco, California, U.S.A..  pp.231-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 337
4.

国際会議録
国際会議録
4. Solid-Phase Epitaxial Regrowth and Dopant Activation of Arsenic-Implanted Metastable Pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)
Lie, D. Y. C. ; Song, J. H. ; Nicolet, M. -A. ; Theodore, N. D. ; Candelaria, J. ; Thomas, S. G. ; Tanner, M. O. ; Wang, K. L.
出版情報: Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A..  pp.467-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 379
5.

国際会議録
国際会議録
5. Microstructure of Oxidized Ge0.78Si0.12 Annealed in a Reducing Ambient
Theodore, N. D. ; Liu, W. S. ; Lie, D. Y. C. ; Cams, T. K. ; Wang, K. L.
出版情報: Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A..  pp.127-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 379
6.

国際会議録
国際会議録
6. Low Temperature Oxidation of Silicon after Copper Ion Implantation
Jaquez, E. J. ; Alford, T. L. ; Theodore, N. D. ; Adams, D. ; Li, Jian ; Russell, S. W. ; Anders, Simone
出版情報: Thermodynamics and kinetics of phase transformations : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.189-,  1996.  Pittsburgh, Penn..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 398
7.

国際会議録
国際会議録
7. STEADY-STATE VERSUS RAPID THERMAL ANNEALING OF PHOSPHORUS-IMPLANTED PSEUDOMORPHIC Si(100)/Ge0.12Si0.88
Lie, D. Y. C. ; Song, J. H. ; Theodore, N. D. ; Eisen, F. ; Nicolet, M. -A. ; Carns, T. K. ; Wang, K. L. ; Kinoshita, H. ; Huang, T-H. ; Kwong, D. L.
出版情報: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.51-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 342
8.

国際会議録
国際会議録
8. Dopant activation and epitaxial regrowth in p-implanted pseudomorphic Ge0.12Si0.88 layers on Si(100)
Lie, D. Y. C. ; Carns, T. K. ; Theodore, N. D. ; Eisen, F. ; Nicolet, M. -A. ; Wang, K. L.
出版情報: Crystallization and related phenomena in amorphous materials : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.485-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 321