1.

国際会議録
国際会議録
1. Computationally efficient ion implantation damage model: modified Kinchin-Pease model
Wang,G. ; Tian,S. ; Morris,M.F. ; Morris,S.J. ; Obradovic,B.J. ; Balamurugan,G. ; Tasch,A.F.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.324-333,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
2.

国際会議録
国際会議録
2. Low-energy model for ion implantation of arsenic and boron into (100) single-crystal silicon
Obradovic,B.J. ; Morris,S.J. ; Morris,M.F. ; Tian,S. ; Wang,G. ; Beardmore,K. ; Snell,C. ; Jackson,J. ; Baummann,S. ; Tasch,A.F.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.342-353,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
3.

国際会議録
国際会議録
3. Design of 0.18-micron NMOSFETs for low-power applications
Khan,S.A. ; Hareland,S.A. ; Tasch,A.F. ; Maziar,C.M. ; Zeitzoff,P.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.197-207,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
4.

国際会議録
国際会議録
4. Experimental verification of a new physically based low-energy (<5 keV) ion implant model
Obradovic,B.J. ; Morris,S.J. ; Morris,M.F. ; Tian,S. ; Wang,G. ; Beardmore,K. ; Snell,C.M. ; Jackson,J. ; Baumann,S. ; Tasch,A.F.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.301-312,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
5.

国際会議録
国際会議録
5. Improved analytic models and efficient parameter extraction for computationally efficient 1D and 2D ion implantation modeling
Balamurugan,G. ; Obradovic,B.J. ; Wang,G. ; Chen,Y. ; Tasch,A.F.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.313-321,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
6.

国際会議録
国際会議録
6. Manufacturing sensitivity analysis of a 0.18-ｦﾌm NMOSFET
Angelo,D. ; Hareland,S.A. ; Khan,S.A. ; Hasnat,K. ; Tasch,A.F. ; Zeitzoff,P.
出版情報: Microelectronic Device and Multilevel Interconnection Technology II.  pp.136-145,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2875
7.

国際会議録
国際会議録
7. Degradation of thin SiO2 sidewall spacers during the selective epitaxial growth for the fabrication of raised source/drain MOSFETs
Unnikrishnan,S. ; Kim,B.Y. ; Wang,C.-L. ; Wu,Y.-K. ; Kwong,D.-L. ; Tasch,A.F.
出版情報: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis.  pp.246-255,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2635