1.

国際会議録
国際会議録
1. Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment
Newcomb,R. ; Kamieniencki,E. ; Danel,A. ; Tardif,F. ; Kitagawara,K. ; Mizuno,M. ; Hirano,Y.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.441-449,  1999.  Pennington, N.J..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3895
2.

国際会議録
国際会議録
2. Extending ellipsometry capabilities for ultrathin gate oxide metrology using rapid optical surface treatment technology
Tardif,F. ; Danel,A. ; Kamieniecki,E. ; Harrington,J.
出版情報: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.126-131,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3882