THERMAL DONOR FORMATION BY THE AGGLOMERATION OF OXYGEN IN SILICON
- 著者名:
- Gosele, U. ( Max-Planck Institute of Metal Physics, Stuttgart, West Germany; )
- Tan,. T. Y. ( IBM, Thomas J. Watson Research Center, Yorktown Heights., NY )
- 掲載資料名:
- Defects in semiconductors II : symposium held November 1982 in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 14
- 発行年:
- 1983
- 開始ページ:
- 153
- 終了ページ:
- 158
- 総ページ数:
- 6
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008121 [0444008128]
- 言語:
- 英語
- 請求記号:
- M23500/14
- 資料種別:
- 国際会議録
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