1.

国際会議録
国際会議録
1. Range and Damage Distribution in Cluster Ion Implantation
Yamada, I. ; Matsuo, J. ; Jones, E. C. ; Takeuchi, D. ; Aoki, T. ; Goto, K. ; Sugii, T.
出版情報: Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A..  pp.363-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 438
2.

国際会議録
国際会議録
2. Bombarding Effects of Gas Cluster Ion Beams on Sapphire Surfaces; Characteristics of Modified Layers and their Mechanical and Optical Properties
Takeuchi, D. ; Matsuo, J. ; Yamada, I.
出版情報: Ion-solid interactions for materials modification and processing : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.279-,  1996.  Pittsburgh.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 396
3.

国際会議録
国際会議録
3. Improving the sensitivity of a vision chip using the software A-D conversion method
Takeuchi, D. ; Kagami, S. ; Komuro, T. ; Ishikawa, M.
出版情報: Sensors and camera systems for scientific, industrial, and digital photography applications V : 19-21 January, 2004, San Jose, California, USA.  pp.138-148,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5301
4.

国際会議録
国際会議録
4. Homoepitaxial Growth of 4H-SiC Thin Film Below 1000oC by Microwave Plasma Chemical Vapor Deposition
Okamoto, M. ; Kosugi, R. ; Tanaka, Y. ; Takeuchi, D. ; Nakashima, S. ; Nishizawa, S. ; Fukuda, K. ; Okushi, H. ; Arai, K.
出版情報: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.299-302,  2002.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 389-393
5.

国際会議録
国際会議録
5. Homoepitaxial Growth of 4H-SiC Thin Film Below 1000oC by Microwave Plasma Chemical Vapor Deposition
Okamoto, Mitsuo ; Kosugi, R. ; Tanaka, Y. ; Takeuchi, D. ; Nakashima, S. ; Nishizawa, S. ; Fukuda, K. ; Okushi, H. ; Arai, K.
出版情報: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.299-302,  2002.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 389-393