1.

国際会議録
国際会議録
1. Kinetic Study on PMMA-CO2 System by Raman Spectroscopy (523)
Takahashi,M. ; Yamamoto,Y. ; Handa,Y.P. ; Nawaby,V.
出版情報: ANTEC 2002, annual technical conference, San Francisco, CA, May 5-9, 2002.  3  pp.3737-3741,  2002.  Brookfield, Conn..  Society of Plastic Engineers.
シリーズ名: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
シリーズ巻号: 60
2.

国際会議録
国際会議録
2. Effect of the dissolution contrast on the process margin in 193-nm lithography
Takahashi,M. ; Kishimura,S. ; Naito,T. ; Ohfuji,T. ; Sasago,M.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.195-204,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
3.

国際会議録
国際会議録
3. Conformational flexibility of domain III of annexin V:the effect of pH and binding to membrane-water interfaces
Sopkova,J. ; Vincent,M. ; Takahashi,M. ; Lewit-Bentley,A. ; Gallay,J.
出版情報: Proceedings of advances in fluorescence sensing technology IV : 24-27 January 1999, San Jose, California.  pp.111-123,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3602
4.

国際会議録
国際会議録
4. Negative-type chemically amplified resists for ArF excimer laser lithography
Naito,T. ; Takahashi,M. ; Ohfuji,T. ; Sasago,M.
出版情報: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.503-511,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3333
5.

国際会議録
国際会議録
5. Correlation between power density fluctuation and grain size distribution of laser-annealed polycrystalline silicon
Suzuki,K. ; Saitou,M. ; Takahashi,M. ; Hayashi,N. ; Terabayashi,T.
出版情報: Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California.  pp.310-319,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3618
6.

国際会議録
国際会議録
6. Acid amplification of chemically amplified resists for 193-nm lithography
Ohfuji,T. ; Takahashi,M. ; Kuhara,K. ; Ogawa,T. ; Ohtsuka,H. ; Sasago,M. ; Ichimura,K.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.76-82,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
7.

国際会議録
国際会議録
7. Optical transition properties of rare-earth ions in nonfluoride halide glasses
Shojiya,M. ; Kadono,K. ; Takahashi,M. ; Kanno,R. ; Kawamoto,Y.
出版情報: Rare-earth-doped devices II : 26-27 January 1998, San Jose, California.  pp.23-30,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3280
8.

国際会議録
国際会議録
8. Damage control during dry etching of EUV mask:I. Control of surface roughness
Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Okazaki,S.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.786-791,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
9.

国際会議録
国際会議録
9. Development of a new color conversion system
Sugiura,H. ; Kagawa,S. ; Takahashi,M. ; Matoba,N.
出版情報: Color imaging : device-independent color, color hardcopy, and graphic arts VI : 23-26 January 2001, San Jose, [California] USA.  pp.278-289,  2001.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4300
10.

国際会議録
国際会議録
10. Removal process for buffer layer on multilayer of EUVL mask
Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Chiba,A. ; Lee,B.-T. ; Ito,M. ; Okazaki,S.
出版情報: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.13-17,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4349