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Fluorinated Silicon Nitride Film Deposited at Low Temperatures from SiH4-SiF4-NH3

著者名:
掲載資料名:
Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
507
発行年:
1999
開始ページ:
471
出版情報:
Warrendale: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994133 [1558994130]
言語:
英語
請求記号:
M23500/507
資料種別:
国際会議録

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