1.

国際会議録
国際会議録
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication
Fritze,M. ; Burns,J.M. ; Wyatt,P.W. ; Astolfi,D.K. ; Forte,T. ; Yost,D. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Liu,H.-Y. ; Shaw,J.C. ; Sullivan,N.T. ; Mastovich,M.E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.388-407,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
3.

国際会議録
国際会議録
3. Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns
Fritze,M. ; Wyatt,P.W. ; Astolfi,D.K. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Chan,D. ; Shaw,J.C. ; Sullivan,N.T. ; Brandom,R. ; Mastovich,M.E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1179-1192,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
4.

国際会議録
国際会議録
4. Importance of measurement accuracy in statistical process control
Askary,F. ; Sullivan,N.T.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.546-554,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
5.

国際会議録
国際会議録
5. Investigation of the effects of charging in SEM-based CD metrology
Davidson,M.P. ; Sullivan,N.T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XI.  pp.226-242,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3050
6.

国際会議録
国際会議録
6. Statistical verification of multiple CD-SEM matching
Erickson,D. ; Sullivan,N.T. ; Elliott,R.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XI.  pp.93-100,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3050
7.

国際会議録
国際会議録
7. Secondary-electron image profiles using bias voltage technique in deep contact hole
Ko,Y.-U. ; Joy,D.C. ; Sullivan,N.T. ; Mastovich,M.E.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.37-45,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
8.

国際会議録
国際会議録
8. Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
Fritze,M. ; Tyrrell,B. ; Astolfi,D.K. ; Davis,P. ; Wheeler,B. ; Mallen,R. ; Jarmolowicz,J. ; Cann,S.G. ; Chan,D.Y. ; Rhyins,P.D. ; Mastovich,M.E. ; Sullivan,N.T. ; Brandom,R. ; Carney,C. ; Fritze,M. ; Blachowicz,B.A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.334-343,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
9.

国際会議録
国際会議録
9. Redefining critical in critical dimension metrology
Askary,F. ; Sullivan,N.T.
出版情報: Metrology, Inspection, and Process Control for Microlithography XV.  pp.815-826,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4344
10.

国際会議録
国際会議録
10. Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology
Dixson,R. ; Sullivan,N.T. ; Schneir,J. ; McWaid,T.H. ; Tsai,V.W. ; Prochazka,J.J. ; Young,M.
出版情報: Metrology, Inspection, and Process Control for Microlithography X.  pp.572-588,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2725