1.

国際会議録
国際会議録
1. Design and Reliability Study for Flip Chip Applications on Ultra-Thin Flexible Substrates using NanoPierce Connection System Technology
Zou, B. ; Kober, M. ; Blum, F. ; Mieslinger, S. ; Gaherty, L. ; Steinberg, W. ; Bahn, B. ; Wernle, M. ; Neahaus, H.
出版情報: Proceedings : 2002 International Symposium on Microelectronics : September 4-6, 2002, Colorado Convention Center, Denver, CO.  pp.818-824,  2002.  Washington, DC.  IMAPS
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4931
2.

国際会議録
国際会議録
2. Results of a round robin measurement on a new CD mask standard
Gans, F. ; Liebe, R. ; Richter, J. ; Schatz, Th. ; Hauffe, B. ; Hillmann, F. ; Dobereiner, S. ; Bruck, H.-J. ; Scheuring, G. ; Brendel, B. ; Bettin, L. ; Roth, K.-D. ; Steinberg, W. ; Schluter, G. ; Speckbacher, P. ; Sedlmeier, W. ; Scherubl, T. ; HaBler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Bosse, H.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.122-133,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
3.

国際会議録
国際会議録
3. Actual measurement data obtained on new 65nm generation mask metrology toot set
Bender, J. ; Ferber, M. ; Roth, K.-D. ; Schluter, G. ; Steinberg, W. ; Scheuring, G. ; Hillmann, F.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.134-144,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
4.

国際会議録
国際会議録
4. Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system
Whittey, J. M. ; Steinberg, W.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.19-25,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
5.

国際会議録
国際会議録
5. Development and characterization of new CD mask standards: a status report
Schaetz, T. ; Hauffe, B. ; Doebereiner, S. ; Brueck, H.-J. ; Brendel, B. ; Bettin, L. ; Roeth, K.-D. ; Steinberg, W. ; Speckbacher, P. ; Sedlmeier, W. ; Engel, T. ; Haessler-Grohne, W. ; Mirande, W. ; Bosse, H.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-53,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148