1.

国際会議録
国際会議録
1. Recent advances in endpoint and in-line monitoring techniques for chemical-mechanical polishing processes
Stein,D.J. ; Hetherington,D.L.
出版情報: In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK.  pp.157-170,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4406
2.

国際会議録
国際会議録
2. Prediction of tungsten CMP pad life using blanket removal rate data and endpoint data obtained from process temperature and carrier motor current measurements
Stein,D.J. ; Hetherington,D.L.
出版情報: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.112-119,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3743
3.

国際会議録
国際会議録
3. Analysis of in-situ vibration monitoring for end-point detection of CMP planarization processes
Hetherington,D.L. ; Stein,D.J. ; Lauffer,J.P. ; Wyckoff,E.E. ; Shingledecker,D.M.
出版情報: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.89-101,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3743
4.

国際会議録
国際会議録
4. In-line monitoring of chemical-mechanical polishing processes
Hetherington,D.L. ; Stein,D.J.
出版情報: In-Line Methods and Monitors for Process and Yield Improvement.  pp.24-35,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3884