1.

国際会議録
国際会議録
1. Single-shot excimer laser annealing:a new tool for poly-AMLCD combined with spectroscopic ellipsometry
Stehle,M.X. ; Zahorski,D. ; Stehle,J.L.
出版情報: Active matrix liquid crystal displays technology and applications : 10-11 February, 1997, San Jose, California.  pp.18-24,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3014
2.

国際会議録
国際会議録
2. Synthesis of high-quality Si1-yCy and Si1-x-yGexCy epitaxial layers on (100)Si by ion implantation and pulsed excimer laser crystallization
Grob,J.-J. ; Fogarassy,E. ; Grob,A. ; Muller,D. ; Prevot,B. ; Stuck,R. ; de Unamuno,S. ; Boher,P. ; Stehle,M.X.
出版情報: ALT '97, International Conference on Laser Surface Processing : 8-12 September 1997, Limoges, France.  pp.47-56,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3404
3.

国際会議録
国際会議録
3. Processing of amorphous silicon flat panel displays with large-area excimer lasers
Stehle,M.X. ; Godard,B. ; Stehle,J.L.
出版情報: Gas and Chemical Lasers and Applications II.  pp.74-79,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2987
4.

国際会議録
国際会議録
4. The growth of Si1-yCy/Si and Si1-x-yGexCy/Si heterostructures by ion implantation and pulsed excimer laser-induced epitaxy
Fogarassy,E. ; Grob,A. ; Grob,J.-J. ; Muller,D. ; Prevot,B. ; Stuck,R. ; Boher,P. ; Stehle,M.X.
出版情報: Laser Applications in Microelectronic and Optoelectronic Manufacturing II.  pp.202-210,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2991