1.

国際会議録
国際会議録
1. IR spectroscopic ellipsometry for industrial characterization of semiconductors
Boher,P. ; Bucchia,M. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.L. ; Pickering,C.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.69-78,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
2.

国際会議録
国際会議録
2. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Pickering,C. ; Tarnowka,A.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.79-89,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
3.

国際会議録
国際会議録
3. Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.P. ; Stehle,J.L.
出版情報: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.30-40,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4449
4.

国際会議録
国際会議録
4. Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays
Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Dubois,A. ; Boccara,A.C.
出版情報: Surface scattering and diffraction for advanced metrology : 1 August 2001 San Diego, USA.  pp.42-52,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4447
5.

国際会議録
国際会議録
5. Single-shot excimer laser annealing:a new tool for poly-AMLCD combined with spectroscopic ellipsometry
Stehle,M.X. ; Zahorski,D. ; Stehle,J.L.
出版情報: Active matrix liquid crystal displays technology and applications : 10-11 February, 1997, San Jose, California.  pp.18-24,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3014
6.

国際会議録
国際会議録
6. Fine characterization of ITO layers by spectroscopic ellipsometry
Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L. ; Suzuki,Y.
出版情報: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.297-300,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2873
7.

国際会議録
国際会議録
7. Thickness and index measurements of 8-ｦﾌm liquid crystal gap between plates by spectroscopic ellipsometry
Defranoux,C. ; Stehle,J.L.
出版情報: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.336-339,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2873
8.

国際会議録
国際会議録
8. Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry
Boher,P. ; Stehle,J.L. ; Piel,J.P. ; Defranoux,C. ; Hennet,L.
出版情報: Metrology, Inspection, and Process Control for Microlithography XI.  pp.205-214,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3050
9.

国際会議録
国際会議録
9. Processing of amorphous silicon flat panel displays with large-area excimer lasers
Stehle,M.X. ; Godard,B. ; Stehle,J.L.
出版情報: Gas and Chemical Lasers and Applications II.  pp.74-79,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2987
10.

国際会議録
国際会議録
10. Spectroscopic ellipsometry and photometry applied to color filter characterization
Defranoux,C. ; Piel,J.P. ; Stehle,J.L.
出版情報: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.184-187,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2873