1.

国際会議録
国際会議録
1. Placement measurement and FE modeling results for distortion control of stencil masks
Ehrmann,A. ; Struck,T. ; Kaesmaier,R. ; Haugeneder,E. ; Loschner,H. ; Butschke,J. ; Letzkus,F. ; Irmscher,M. ; Springer,R. ; Engelstad,R.L.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.822-830,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
2.

国際会議録
国際会議録
2. PN and SOI wafer flow process for stencil mask fabrication
Butschke,J. ; Ehrmann,A. ; Haugeneder,E. ; Irmscher,M. ; Kasmaier,R. ; Kragler,K. ; Letzkus,F. ; Loschner,H. ; Mathuni,J. ; Rangelow,I.W. ; Reuter,C. ; Shi,F. ; Springer,R.
出版情報: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.20-29,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3665
3.

国際会議録
国際会議録
3. Progress in placement control for ion beam stencil mask technology
Kamm,F.-M. ; Ehrmann,A. ; Struck,T. ; Kragler,K. ; Butschke,J. ; Letzkus,F. ; Springer,R. ; Haugeneder,E. ; Degen,A. ; Voigt,J. ; Kratzenberg,M. ; Rangelow,I.W.
出版情報: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.18-22,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4349
4.

国際会議録
国際会議録
4. Resist technologies for ion projection lithography(IPL)stencil maskmaking
Irmscher,M. ; Butschke,J. ; Elian,K. ; Hoefflinger,B. ; Kragler,K. ; Letzkus,F. ; Ochsenhirt,J. ; Reuter,C. ; Springer,R.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.362-372,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
5.

国際会議録
国際会議録
5. Systems of fiber-coupled diode lasers as versatile sources of high-brightness radiation (Invited Paper)
Bartelt-Berger,L. ; Becker,U. ; Brauch,U. ; Fleig,C. ; Giesen,A. ; Lucke,B. ; Opower,H. ; Schomburg,C. ; Schubert,M. ; Springer,R.
出版情報: 10th Meeting on Optical Engineering in Israel, 2-6 March 1997, Jerusalem, Israel.  Part 1  pp.310-316,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3110
6.

国際会議録
国際会議録
6. Stencil mask key parameter measurement and control
Ehrmann,A. ; Elsner,A. ; Liebe,R. ; Struck,T. ; Butschke,J. ; Letzkus,F. ; Irmscher,M. ; Springer,R. ; Haugeneder,E. ; Loschner,H.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.373-384,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
7.

国際会議録
国際会議録
7. IPI stencil mask distortions:experimental and theoretical analysis
Ehrmann,A. ; Struck,T. ; Haugeneder,E. ; Loschner,H. ; Butschke,J. ; Letzkus,F. ; Irmscher,M. ; Springer,R.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.385-394,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
8.

国際会議録
国際会議録
8. Optimization of the e-beam sensitive bilayer CARL process for stencil mask making
Ochsenhirt,J. ; Butschke,J. ; Letzkus,F. ; Hofflinger,B. ; lrmscher,M. ; Reuter,C. ; Springer,R. ; Elian,K.
出版情報: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.80-89,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3996
9.

国際会議録
国際会議録
9. Progress in placement control for ion beam stencil mask technology
Kamm,F.-M. ; Ehrmann,A. ; Struck,T. ; Kragler,K. ; Bustschke,J. ; Letzkus,F. ; Springer,R. ; Haugeneder,E.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.460-465,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
10.

国際会議録
国際会議録
10. High-performance TSI process for e-beam using vapor-applied crosslinking silylating agents
Irmscher,M. ; Hofflinger,B. ; Springer,R. ; Stauffer,C. ; Peterson,W.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.564-577,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724