1.

国際会議録
国際会議録
1. Effect of real masks on wafer patterning
Spence,C.A. ; Subramanian,R. ; Teng,D. ; Gallardo,E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.54-62,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
2.

国際会議録
国際会議録
2. CD uniformity consideration for DUV step and scan tools
Seltmann,R. ; Minvielle,A.M. ; Spence,C.A. ; Muehle,S. ; Capodieci,L. ; Nguyen,K.B.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.239-249,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
3.

国際会議録
国際会議録
3. Extending the limits of i-line lithography for via layers and minimization of dense-iso bias
Subramanian,R. ; Spence,C.A. ; Capodieci,L. ; Werner,T. ; Gallardo,E.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.914-922,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679
4.

国際会議録
国際会議録
4. Impact of coma on CD control for multiphase PSM designs
Schmidt,R.T. ; Spence,C.A. ; Capodieci,L. ; Krivokapic,Z. ; Geh,B. ; Flagello,D.G.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.15-24,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
5.

国際会議録
国際会議録
5. Impact of optical enhancement techniques on the mask error enhancement function(MEEF)
Plat,M.V. ; Nguyen,K.B. ; Spence,C.A. ; Lyons,C.F. ; Wilkison,A.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.206-214,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
6.

国際会議録
国際会議録
6. Defect printability for sub-0.18ｦﾌm design rules using 193-nm lithography process and binary OPC reticle
Phan,K.A. ; Spence,C.A. ; Schefske,J.A. ; Okoroanyanwu,U. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.773-780,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
7.

国際会議録
国際会議録
7. Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system
Phan,K.A. ; Spence,C.A. ; Dakshina-Murthy,S. ; Bala,V. ; Williams,A.M. ; Strener,S. ; Eandi,R.D. ; Li,J. ; Karklin,L.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.681-694,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
8.

国際会議録
国際会議録
8. Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers
Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellenberg,F.M.
出版情報: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.277-287,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3873
9.

国際会議録
国際会議録
9. Sub-100-nm and deep sub-100-nm MOS transistor gate patterning
Xiang,Q. ; Gupta,S. ; Spence,C.A. ; Singh,B. ; Yeap,G.C.-F. ; Lin,M.-R.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.243-252,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
10.

国際会議録
国際会議録
10. Enhanced dispositioning of reticle defects using the Virtual Stepper with automated defect severity scoring
Cai,L. ; Phan,K.A. ; Spence,C.A. ; Pang,L. ; Chan,K.K.
出版情報: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.467-478,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4409