1.

国際会議録
国際会議録
1. A Novel Approach to Contact Integration at 90-nm and Beyond
Singhal, A. ; Sparks, T. ; Strozewski, K. ; Huang, F. ; Parihar, S. ; Schmidt, J. ; Boeck, B. ; Fretwell, J. ; Veap, G. ; Sheth, V. ; Veeraghavan, S. ; Melnick, B.
出版情報: ULSI Process Integration : proceedings of the International Symposium.  pp.217-222,  2003.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-6
2.

国際会議録
国際会議録
2. High Density Plasma Oxide Etching for 0.35 Micron Contacts and Beyond
Chebi, R. ; Sparks, T. ; Arleo, P. ; Marks, J.
出版情報: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.216-227,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-21
3.

国際会議録
国際会議録
3. High Density Plasma (HDP) Oxide Etching with Reduced Global Warming Emission Using 2H-Heptafluoropropane
Pruette, L. ; Karecki, S. ; Reif, R. ; Sparks, T. ; Beu, L. ; Vartanian, V.
出版情報: Environmental issues in the electronics/semiconductor industries and electrochemical/photochemical methods for pollution abatement.  pp.58-62,  1998.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-5
4.

国際会議録
国際会議録
4. Integration Challenges of Inorganic Low-k (k ｡？2.5) Materials With Cu for Sub-0.25 ｦﾌm Multilevel Interconnects
Yu, K. C. ; Defilippi, J. ; Tiwari, R. ; Sparks, T. ; Smith, D. ; Olivares, M. ; Selinidis, S. ; Zhang, J. ; Junker, K. ; Braekelmann, G. ; Farkas, J. ; Lee, K. S. ; Filipiak, S. ; Lindell, M. ; Watanabe, J. K. ; Wetzel, J. T. ; Jawarani, D. ; Herrick, M. T. ; Cave, N. G. ; Hobbs, C. C.
出版情報: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.499-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 564
5.

国際会議録
国際会議録
5. Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology
Venkatraman, R. ; Jain, A. ; Farkas, J. ; Mendonca, J. ; Hamilton, G. ; Capasso, C. ; Denning, D. ; Simpson, C. ; Rogers, B. ; Frisa, L. ; Ong, T. P. ; Herrick, M. ; Kaushik, V. ; Gregory, R. ; Apen, E. ; Angyal, M. ; Filipiak, S. ; Crabtree, P. ; Sparks, T. ; Anderson, S.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.41-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
6.

国際会議録
国際会議録
6. Integration Challenges of Inorganic Low-K (K < 2.5) Materials With Cu for Sub-0.25)μm Multilevel Interconnects
Blumenthal, R. ; Braekelmann, G. ; Cave, N. G. ; Conner, J. ; Crabtree, P. ; Defilippi, J. ; Denning, D. ; Farkas, J. ; Filipiak, S. ; Fowler, B. W. ; Fox, R. ; Freeman, M. ; Garcia, S. ; Herrick, M. T. ; Hershey, R. ; Hobbs, C. C. ; Jawarani, D. ; Junker, K. ; Keyes, C. ; Kirksey, S. ; Lee, J. J. ; Lee, K. S. ; Lindell, M. ; Mora, R. ; Neil, T. ; Nguyen, T. ; Olivares, M. ; Pena, T. Newton. D. ; Selinidis, S. ; Sieloff, D. D. ; Smith, D. ; Sparks, T. ; Stankus, JJ. ; Tiwari, R. ; VanGompel, T. ; Watanabe, J. K. ; Weitzman, E. J. ; Wetzel, J. T. ; Yu, K. C. ; Zhang, J.
出版情報: Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.151-160,  1999.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 565
7.

国際会議録
国際会議録
7. The Evaluation of Hexafluorobenzene as an Environmentally Benign Dielectric Etch Chemistry
Chatterjee, R. ; Karecki, S. ; Reif, R. ; Sparks, T. ; Vartanian, V. ; Goolsby, B.
出版情報: Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries : proceedings of the fourth International Symposium.  pp.28-37,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-6