Accuracy of transmittance measurement of inspection machine for semitransparent defect and its detectability
- 著者名:
Kim,J.B. ( DuPont Photomasks Korea Ltd. ) Hur,I.B. Jeong,S.H. Son,Y.S. Lee,K.Y. Lee,S.W. Shin,C. Kim,H.S. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 507
- 終了ページ:
- 511
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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4
国際会議録
Comparative evaluation of mask production CAR development processes with stepwise defect inspection
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
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