1.

国際会議録
国際会議録
1. Organosiloxane based bottom antireflective coatings for 193nm lithography
Son, E.-K. ; Kim, J.-W. ; Lee, S.-H. ; Park, C.-S. ; Lee, J.-W. ; Kim, J. ; Lee, G.-S. ; Lee, S.-K. ; Ban, K.-D. ; Jung, J.-C. ; Bok, C. K. ; Moon, S.-C.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.449-458,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
2.

国際会議録
国際会議録
2. Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
Kim, J.-W. ; Son, E.-K. ; Lee, S.-H. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
出版情報: Advances in Resist Technology and Processing XXI.  pp.599-607,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
3.

国際会議録
国際会議録
3. Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists
Kang, J.-H. ; Oh, S.-K. ; Son, E.-K. ; Kim, J.-W. ; Kim, Y.-H. ; Choi, Y.-J. ; Kim, D.-B. ; Kim, J.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1052-1062,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039