1.

国際会議録
国際会議録
1. Modeling of transmittance degradation caused by optical surface contamination by atomic oxygen reaction with adsorbed silicones
Snyder,A. ; Banks,B.A. ; Miller,S.K. ; Stueber,T. ; Sechkar,E.
出版情報: Optical systems contamination and degradation II : effects, measurements, and control : 2-3 August 2000, San Diego, USA.  pp.157-168,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4096
2.

国際会議録
国際会議録
2. New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
Dao,G.T. ; Liu,G. ; Snyder,A. ; Farnsworth,J.N.
出版情報: Photomask and X-Ray Mask Technology III.  pp.359-370,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2793