1.

国際会議録
国際会議録
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
2.

国際会議録
国際会議録
2. Plasma etch process characterization: an application of atomic force microscopy
Yang,W. ; Singh,B.
出版情報: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.30-40,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3332
3.

国際会議録
国際会議録
3. Specular spectroscopic profilometry for the sub-0.18ｦﾌm polySi-gate processes
Niu,X. ; Jakatdar,N.H. ; Yedur,S.K. ; Singh,B.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.846-855,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
4.

国際会議録
国際会議録
4. Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Romero,J. ; Singh,B. ; Lee,S.-J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.781-790,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
5.

国際会議録
国際会議録
5. Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry:157 nm and below
Hilfiker,J.N. ; Singh,B. ; Synowicki,R.A. ; Bungay,C.L.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.390-398,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
6.

国際会議録
国際会議録
6. Automated process control monitor for 0.18-ｦﾌm technology and beyond
Choo,B. ; Riley,T. ; Schulz,B. ; Singh,B.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.218-226,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
7.

国際会議録
国際会議録
7. Wireless optics protection of fiber via SONET ring closure
Mullen,R.A. ; Celmer,K.T. ; Foster,M. ; Wooten,J. ; Miller,J. ; Kean,J.C. ; Carter,D. ; Kefauver,M. ; Singh,B. ; Achour,M. ; Willebrand,H.
出版情報: Optical wireless communications III : 6-7 November 2000, Boston, USA.  pp.55-62,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4214
8.

国際会議録
国際会議録
8. Automated OPC optimization using in-line CD-SEM
Su,B. ; Menaker,M. ; Haas,N. ; Subramanian,R. ; Singh,B.
出版情報: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.80-86,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4181
9.

国際会議録
国際会議録
9. Improving stigmation control of the CD-SEM
Choo,B. ; Punjabi,S. ; Morales,C. ; Singh,B. ; Templeton,M.K. ; Davidson,M.P.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.57-64,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
10.

国際会議録
国際会議録
10. Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology
Subramanian,R. ; Brown,S.E. ; Chen,S.H. ; Morales,C. ; Gallardo,E. ; Singh,B.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.178-186,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998