1.

国際会議録
国際会議録
1. In-line TEM sample preparation and wafer return strategy for rapid yield learning [6152-81]
Bicais-Lepinay, N. ; Andre, F. ; Brevers, S. ; Guyader, P. ; Trouiller, C. ; Kwakman, L. F. Tz. ; Pokrant, S. ; Verkleij, D. ; Schampers, R. ; Ithier, L. ; Sicurani, E.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615217-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
2.

国際会議録
国際会議録
2. Automated defect cross-sectioning with an in-line DualBeam
Blanc-Coquand, S. ; Hinschberger, B. ; Rouchouze, E. ; Sicurani, E. ; Castagna, M. ; Weschler, M. ; Dworkin, L. ; Renard, D. ; Panyasak, A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.819-826,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375