1.

国際会議録
国際会議録
1. Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153]
Yedur, S. ; Vuong, V. ; Shivaprasad, D. ; Sarathy, T. P. ; Tabet, M. ; Korlahalli, R. ; Hu, J.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
2.

国際会議録
国際会議録
2. Sensitivity of the silicon layer thickness in SOI process in the UV regime
Shivaprasad, D. ; Boltich, E.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.776-782,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689