1.

国際会議録
国際会議録
1. Highly Reliable Raised Source/Drain Formation Process by Selective Si Deposition for 50 nm Junction-Depth MOSFETs
Yasunaga, T. ; Shishiguchi, S. ; Saito, S.
出版情報: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.335-346,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-3
2.

国際会議録
国際会議録
2. Shallow Junction Formation by Low Energy Implant and High Ramp-Up Rate RTA Process
Shishiguchi, S. ; Mineji, A. ; Maisuda, T.Y. ; Kitajima, H.
出版情報: Advances in rapid thermal processing : proceedings of the symposium.  pp.105-116,  1999.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-10
3.

国際会議録
国際会議録
3. Ultra Shallow Junction Formation by RTA at High Temperature for Short Heating Cycle Time
Saito, S. ; Shishiguchi, S. ; Mineji, A. ; Matsuda, T.
出版情報: Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.3-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 532
4.

国際会議録
国際会議録
4. Resistivity Reduction of Thin Polycrystalline Silicon Films Crystallized from In Situ Phosphorus-Doped Amorphous Silicon Deposited Using Silane or Disilane
Oguro, S. ; Shishiguchi, S. ; Arai, K.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.504-511,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
5.

国際会議録
国際会議録
5. Preparation of high-aspect-ratio 70-nm patterns by supercritical drying technique in proximity x-ray lithography
Kikuchi, Y. ; Fukuda, T. ; Shishiguchi, S. ; Masuda, K. ; Kawakami, N.
出版情報: Emerging Lithographic Technologies VI.  Part Two  pp.896-902,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4688