1.

国際会議録
国際会議録
1. Mesoscale structures of stratiform precipitation on the Tibetan plateau using an X-band Doppler radar and TRMM PR
Shimizu,S.
出版情報: Microwave remote sensing of the atmosphere and environment II : 9-12 October 2000, Sendai, Japan.  pp.33-41,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4152
2.

国際会議録
国際会議録
2. Nikon EB Stepper: the latest development status
Suzuki,K. ; Fujiwara,T. ; Hada,K. ; Hirayanagi,N. ; Kawata,S. ; Morita,K. ; Okamoto,K. ; Okino,T. ; Shimizu,S. ; Yahiro,T. ; Yamamoto,H.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.80-87,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
3.

国際会議録
国際会議録
3. Data of scattered electron characteristics in 1OO-kV EB stepper
Morita,K. ; Yahiro,T. ; Shimizu,S. ; Yamamoto,H. ; Hirayanagi,N. ; Fujiwara,T. ; Suzuki,S. ; Shimizu,H. ; Kawata,S. ; Okino,T. ; Suzuki,K.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.703-712,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
4.

国際会議録
国際会議録
4. Investigation of proximity effect correction in electron projection lithography(EPI)
Okino,T. ; Suzuki,K. ; Okamoto,K. ; Kawata,S. ; Uchikawa,K. ; Suzuki,S. ; Shimizu,S. ; Fujiwara,T. ; Yamada,A. ; Kamijo,K.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.235-244,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
5.

国際会議録
国際会議録
5. Nikon EB stepper:its system concept and countermeasures for critical issues
Suzuki,K. ; Fujiwara,T. ; Hada,K. ; Hirayanagi,N. ; Kawata,S. ; Morita,K. ; Okamoto,K. ; Okino,T. ; Shimizu,S. ; Yahiro,T.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.214-224,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
6.

国際会議録
国際会議録
6. Repair method on silicon stencil reticles for EB projection lithography
Shimizu,S. ; Kawata,S. ; Kaito,T.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.560-567,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
7.

国際会議録
国際会議録
7. Highly accurate CD control at stitching region for electron-beam projection lithography
Fujiwara,T. ; Irita,T. ; Shimizu,S. ; Yamamoto,H. ; Suzuki,K.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.727-735,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343
8.

国際会議録
国際会議録
8. Audio watermarking method robust against time-and frequency-fluctuation
Tachibana,R. ; Shimizu,S. ; Nakamura,T. ; Kobayashi,S.
出版情報: Security and Watermarking of Multimedia Contents III.  pp.104-115,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4314
9.

国際会議録
国際会議録
9. EPL reticle technology
Katakura,N. ; Takahashi,S. ; Okada,M. ; Shimizu,S. ; Kawata,S.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.893-901,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562