1.

国際会議録
国際会議録
1. CD analysis of advanced photolithography and its impact on critical design structures [6156-12]
Romero, K. A. ; Seltmann, R. ; Burbach, G. ; Stephan, R. ; Paufler, J. ; Greenlaw, D.
出版情報: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6156
2.

国際会議録
国際会議録
2. ACLV-analysis in production and its impact on product performance
Seltmann, R. ; Stephan, R. ; Mazur, M. ; Spence, C. ; Fontaine, B.L. ; Stankowski, D. ; Poock, A. ; Grundke, W.
出版情報: Optical Microlithography XVI.  Part One  pp.530-540,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
3.

国際会議録
国際会議録
3. In-field overlay uncertainty contributors: a back end study [6152-39]
Adel, M. ; Frommer, A. ; Kassel, E. ; Izikson, P. ; Leray, P. ; Schulz, B ; Seltmann, R. ; Bush, G.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615213-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
4.

国際会議録
国際会議録
4. Overlay accuracy in 0.18-μm copper dual-damascene process
Schulz, B. ; Levinson, H.J. ; Seltmann, R. ; Seligson, J.L. ; Izikson, P. ; Ronen, A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.386-396,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689