1.

国際会議録
国際会議録
1. Global Model of Silicon Chemical Vapor Deposition in Centura Reactors
Segal, A.S. ; Kondratyev, A.V. ; Galyskov, A.O. ; Kampov, S.Yu. ; Makarov, Yu.N. ; Sieberm, W. ; Siarek, P. ; Lowmy, S.
出版情報: CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition.  pp.456-463,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-13
2.

国際会議録
国際会議録
2. Growth of AlN Bulk Crystals by Sublimation Sandwich Method
Mokhov, E.N. ; Roenkov, A.D. ; Vodakov, Yu.A. ; Karpov, S.Yu. ; Ramm, M.S. ; Segal, A.S. ; Makarov, Yu.A. ; Helava, H.
出版情報: Silicon carbide and related materials 2002 : ECSCRM2002, proceedings of the 4th European Conference on Silicon Carbide and Related Materials, September 2-5, 2002, Linköping, Sweden.  pp.979-982,  2003.  Zuerich, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 433-436
3.

国際会議録
国際会議録
3. Modeling of SiGe Epitaxial Growth in a Wide Range of Growth Conditions
Segal, A.S. ; Sid'ko, A.P. ; Karpov, S.Yu. ; Makarov, Yu N.
出版情報: Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium.  pp.229-236,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-13