1.

国際会議録
国際会議録
1. Fabrication of Sub-0.1 um Contacts with 193 nm CARL Photo- Lithography by a Combination of ICP Dry Development and MORI HDP Oxide Etch
Song, V. ; Watson, A. ; Thomas, D. ; Powell, K. ; Raske, H.E. ; Domke, W.O. ; Sebald, M.
出版情報: Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium.  pp.226-232,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-30
2.

国際会議録
国際会議録
2. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
出版情報: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5753(1)
3.

国際会議録
国際会議録
3. Novel fluoro copolymers for 157-nm photoresists: a progress report
Hohle, C. ; Hien, S. ; Eschbaumer, C. ; Rottstegge, J. ; Sebald, M.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.41-50,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
4.

国際会議録
国際会議録
4. Interference patterning of gratings with a period of 150 nm at a wavelength of 157 nm
Fuetterer, G. ; Herbst, W. ; Rottstegge, J. ; Ferstl, M. ; Sebald, M. ; Schwider, J.
出版情報: Optical Microlithography XV.  Part Two  pp.1703-1713,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
5.

国際会議録
国際会議録
5. Ultrathin film imaging at 157nm
Rottstegge, J. ; Herbst, W. ; Hien, S. ; Fuetterer, G. ; Eschbaumer, C. ; Hohle, C. ; Schwider, J. ; Sebald, M.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.233-241,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
6.

国際会議録
国際会議録
6. Recent advances in fluorinated resists for application at 157 nm
Houlihan, F.M. ; Sakamuri, R. ; Romano, A. ; Rentkiewicz, D. ; Dammel, R.R. ; Conley, W.E. ; Miller, D.A. ; Sebald, M. ; Stepanenko, N. ; Markert, M. ; Mierau, U. ; Vermeir, I. ; Hohle, C. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
出版情報: Advances in Resist Technology and Processing XXI.  pp.134-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376