1.

国際会議録
国際会議録
1. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.I. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2
2.

国際会議録
国際会議録
2. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.J. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2