1.

国際会議録
国際会議録
1. Compensation of chromatic dispersion and polarization mode dispersion in optical transmission systems (Invited Paper)
Meissner, P. M. ; Merker, T. ; Schumacher, K. ; Boehm, S.
出版情報: Active and passive optical components for WDM communications III : 8-11 September, 2003, Orlando, Florida, USA.  pp.721-730,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5246
2.

国際会議録
国際会議録
2. Pore structural characteristics of mesostructured materials prepared under different conditions
Candeias, A.E. ; Carrott, M.M.L. Ribeiro ; Carrott, P.J.M. ; Schumacher, K. ; Grun, M. ; Unger, K.K.
出版情報: Characterization of porous solids VI : proceedings of the 6th International Symposium on the Characterization of Porous Solids (COPS-VI), Alicante, Spain, May 8-11, 2002.  pp.363-370,  2002.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 144
3.

国際会議録
国際会議録
3. Rational design, tailored synthesis and characterisation of ordered mesoporous silicas in the micron and submicron size range
Grun, M. ; Buchel, G. ; Kumar, D. ; Schumacher, K. ; Bidlingmaier, B. ; Unger, K. K.
出版情報: Characterisation of porous solids V : proceedings of the 5th International Symposium on the Characterisation of Porous Solids (COPS-V), Heidelberg, Germany, May 30-June 2, 1999.  pp.155-,  2000.  New York.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 128
4.

テクニカルペーパー
テクニカルペーパー
4. Design for Lean Manufacturing.
Hines, S. ; Schumacher, K. ; Becker, T.M. ; Tiem, D.V.
出版情報: 2003 SAE world congress : technical paper.  2003.  Warrendale, Penn..  Society of Automotive Engineers
シリーズ名: Society of Automotive Engineers technical paper series
シリーズ巻号: 2003
5.

国際会議録
国際会議録
5. Optical and electrical approaches for reduction of polarization mode dispersion limitations (Invited Paper)
Schumacher, K. ; Boehm, S. ; Merker, T. ; Meissner, P.
出版情報: Optical Transmission Systems and Equipment for WDM Networking III.  pp.135-148,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5596
6.

国際会議録
国際会議録
6. Overlay improvement by non-linear error correction and non-linear error control by APC [6152-156]
Choi, D. ; Jahnke, A. ; Schumacher, K. ; Hoepfl, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61523W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
7.

国際会議録
国際会議録
7. Methods for in-service measurement of polarization mode dispersion (Invited Paper) [6388-25]
Boehm, S. ; Schumacher, K. ; Meissner, P.
出版情報: Optical Transmission Systems and Equipment for Networking V.  pp.63880M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6388
8.

国際会議録
国際会議録
8. Compensation of chromatic dispersion and polarization mode dispersion in optical transmission systems (Invited Paper)
Meissner, P. M. ; Merker, T. ; Schumacher, K. ; Boehm, S.
出版情報: Optical Transmission Systems and Equipment for WDM Networking II.  pp.71-80,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5247
9.

国際会議録
国際会議録
9. Comparison and optimization of the transmission performances of various advanced modulation formats in high bit rate systems [6388-19]
Maiga, B. I. ; Schumacher, K. ; Meissner, P.
出版情報: Optical Transmission Systems and Equipment for Networking V.  pp.63880G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6388
10.

国際会議録
国際会議録
10. Advances in process overlay on 300-mm wafers
Staecker, J. ; Arendt, S. ; Schumacher, K. ; Mos, E.C. ; van Haren, R.J. ; van der Schaar, M. ; Edart, R. ; Demmerie, W. ; Tolsma, H.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.927-936,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689