1.

国際会議録
国際会議録
1. Growth of Hydrogenated Microcrystalline Silicon (μc-Si:H) Films by HWCVD Using a Graphite Catalyzer
Bhusari, D.M. ; Kumar, P. ; Kupich, M. ; Schroeder, B.
出版情報: Amorphous and nanocrystalline silicon science and technology - 2004 : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.395-400,  2004.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 808
2.

国際会議録
国際会議録
2. Guiding Principle to Develop Intrinsic Microcrystalline Silicon Absorber Layer for Solar Cell by Hot-Wire CVD
Middya, A.R. ; Weber, U. ; Mukherjee, C. ; Schroeder, B.
出版情報: Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A..  2001.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 664
3.

国際会議録
国際会議録
3. CORRELATION BETWEEN STRUCTURAL AND PHOTOELECTRICAL PROPERTIES OF a-Si1-x Gex:H ALLOY FILMS--NEW INTERPRETATION CONCERNING THE PREFERENTIAL ATTACHMENT OF HYDROGEN
Schroeder, B. ; Leidner, M. ; Oechsner, H.
出版情報: Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.277-282,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 219