1.

国際会議録
国際会議録
1. Outplating of Metallic Contaminants on Silicon Wafers from Diluted Acid Solutions
Rotondaro, A. L. P. ; Hurd, T. Q. ; Schmidt, H. F. ; Teerlinck, I. ; Heyns, M. M. ; Claeys, C.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.183-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
2.

国際会議録
国際会議録
2. HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES
Verhaverbeke, S. ; Bender, H. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. F. ; Heyns, M. M.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.457-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315