1.

国際会議録
国際会議録
1. Image performance and mask characterization of 157-nm alternating phase-shifting mask
Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.
出版情報: Optical Microlithography XVI.  Part One  pp.618-628,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
2.

国際会議録
国際会議録
2. Actinic aerial image measurement tool for 157-nm mask qualification
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Semmler, A.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.533-544,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
3.

国際会議録
国際会議録
3. Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles
Eisner, K. ; Schilz, C.M. ; Williams, A. ; Hien, S. ; Verbeek, M.
出版情報: Optical Microlithography XV.  Part One  pp.552-560,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4691
4.

国際会議録
国際会議録
4. Actinic aerial image measurement tool for 157-nm lithography
Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Yasui, T. ; Higashikawa, I. ; Schilz, C.M. ; Semmler, A.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.400-406,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
5.

国際会議録
国際会議録
5. Performance of the aerial image measurement system for 157-nm lithography
Kuschnerus, P. ; Engel, T. ; Harnisch, W. ; Hertfelder, C. ; Zibold, A.M. ; Urbach, J.-P. ; Schilz, C.M. ; Eisner, K.
出版情報: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.62-70,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5148
6.

国際会議録
国際会議録
6. Aerial image measurement system for 157-nm lithography
Eisner, K. ; Kuschnerus, P. ; Urbach, J.-P. ; Schilz, C.M. ; Engel, T. ; Zibold, A.M. ; Yasui, T. ; Higashikawa, I.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.469-477,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
7.

国際会議録
国際会議録
7. Actinic aerial image measurement for qualification of defect on 157-nm photomask
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.743-750,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446
8.

国際会議録
国際会議録
8. First results from AIMS beta tool for 157-nm lithography
Teuber, S. ; Higashikawa, I. ; Urbach, J.-P. ; Schilz, C.M. ; Koehle, R. ; Zibold, A.M.
出版情報: Optical Microlithography XVII.  pp.1648-1657,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377