1.

国際会議録
国際会議録
1. Using the aerial image measurement technique to speed up mask development for 193-nm immersion and polarization lithography
Zibold, A. M. ; Harnisch, W. ; Scherubl, T. ; Rosenkranz, N. ; Greif, J.
出版情報: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.223-232,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5645
2.

国際会議録
国際会議録
2. Results of a round robin measurement on a new CD mask standard
Gans, F. ; Liebe, R. ; Richter, J. ; Schatz, Th. ; Hauffe, B. ; Hillmann, F. ; Dobereiner, S. ; Bruck, H.-J. ; Scheuring, G. ; Brendel, B. ; Bettin, L. ; Roth, K.-D. ; Steinberg, W. ; Schluter, G. ; Speckbacher, P. ; Sedlmeier, W. ; Scherubl, T. ; HaBler-Grohne, W. ; Frase, C. G. ; Czerkas, S. ; Dirscherl, K. ; Bodermann, B. ; Mirande, W. ; Bosse, H.
出版情報: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.122-133,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5835
3.

国際会議録
国際会議録
3. Aerial image measurement technique for today's and future 193-nm lithography mask requirements
Zibold, A. M. ; Scherubl, T. ; Menck, A. ; Brunner, R. ; Greif, J.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.12-18,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
4.

国際会議録
国際会議録
4. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
5.

国際会議録
国際会議録
5. EUV mask simulation for AIMS
Windpassinger, R. ; Rosenkranz, N. ; Scherubl, T. ; Evanschitzky, P. ; Erdmann, A. ; Zibold, A.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1249-1258,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256
6.

国際会議録
国際会議録
6. Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion [5853-131]
Zibold, A. M. ; Poortinga, E. ; Doornmalen, H. v. ; Schmid, R. ; Scherubl, T. ; Harnisch, W.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.371-379,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853