GROWTH OF Si1-xGex STRAINED LAYERS USING ATMOSPHERIC-PRESSURE CVD
- 著者名:
Namavar, F. Manke, J.M. Kvam, E.P. Sanfacon, M.M. Perry, C.H. Kalkhoran, N.M. - 掲載資料名:
- Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 220
- 発行年:
- 1991
- 開始ページ:
- 285
- 終了ページ:
- 290
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991149 [155899114X]
- 言語:
- 英語
- 請求記号:
- M23500/220
- 資料種別:
- 国際会議録
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