1.

国際会議録
国際会議録
1. Effect of Aging on Stress in Silicon Nitride Films by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition Technique.
Sah, R.E. ; Baumann, H. ; Serries, D. ; Kiefer, R. ; Braunstein, J.
出版情報: Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium.  pp.26-37,  1999.  Pennington, New Jersey.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-6
2.

国際会議録
国際会議録
2. Low-Temperature Plasma Deposition of Passivating Layers with Low Hydrogen Content for Optoelectronic Devices
Sah, R.E. ; Baumann, H.
出版情報: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.214-220,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-2
3.

国際会議録
国際会議録
3. Wet Etching Studies on Electron Cyclotron Resonance (ECR) Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Films
Sundaram, K.B. ; Sah, R.E. ; Balachandran, K.
出版情報: Plasma processing XIII : proceedings of the international symposium.  pp.34-41,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-6
4.

国際会議録
国際会議録
4. ECR-Plasma Deposited Oxygen-Free SiNx Films for Low and High Reflectivity Coatings for GaAs Based Devices
Sah, R.E. ; Weimar, W. ; Baumann, H. ; Wagner, J. ; Kiefer, R. ; Muller, S.
出版情報: Proceedings of the twenty-sixth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXVI).  pp.178-185,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-1
5.

国際会議録
国際会議録
5. Passivation of III/V-based Compound Semiconductor Devices Using High-Density Plasma Deposited Silicon Nitride Films
Sah, R.E. ; Mikulla, M. ; Schneider, H. ; Benkhelifa, F. ; Dammann, M. ; Quay, R. ; Fleisner, J. ; Walther, M. ; Weimann, G.
出版情報: State-of-the-art program on compound semiconductors (SOTAPOCS XLII) and processes at the compound-semiconductor/solution interface : proceedings of the international symposia.  pp.338-349,  2005.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-04
6.

国際会議録
国際会議録
6. High Density Plasma Deposited Silicon Nitride Films for Coating InGaAlAs High-Power Lasers
Sah, R.E. ; Rinner, F. ; Keifer, R. ; Mikulla, M. ; Weimann, G.
出版情報: Plasma processing XIV : proceedings of the international symposium.  pp.35-42,  2002.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-17
7.

国際会議録
国際会議録
7. Composition and Mechanical Properties of Sill-con Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma-Enhanced Chemi-cal Vapor Deposition Technique
Sah, R.E. ; Baumann, H. ; Ohle, T.
出版情報: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.552-564,  1997.  Pennington, New Jersey.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-10