1.

国際会議録
国際会議録
1. Material Properties of Cast Aluminium Alloys Produced by Various Casting Processes
M. Okayasu ; K. Ota ; S. Takeuchi ; T. Shiraishi
出版情報: Light Metals Technology 2013 : Selected, peer reviewed papers from the Sixth International Light Metals Technology Conference (LMT 2013), July 24-26, 2013, Old Windsor, United Kingdom.  pp.241-244,  2013.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 765
2.

国際会議録
国際会議録
2. Development of the global cloud free data set of MODIS
Y. Oguro ; S. Takeuchi ; Y. Suga
出版情報: Remote sensing for environmental monitoring, GIS applications, and geology VI : 13-14 September 2006, Stockholm, Sweden.  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6366
3.

国際会議録
国際会議録
3. Void creating inside a transparent resin material using nano-pulse Nd: YAG laser
S. Yamamoto ; S. Takeuchi ; D. Tokita ; Y. Ishii ; Y. Kubota ; K. Watanabe
出版情報: XVI International Symposium on Gas Flow, Chemical Lasers,and High-Power-Lasers : 4-8 September 2006, Gmunden, Austria.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6346
4.

国際会議録
国際会議録
4. Extraction of vegetation cover rate in urban areas based on mixel analyses of Landsat data
S. Takeuchi ; T. Konishi
出版情報: Remote sensing for environmental monitoring, GIS applications, and geology VI : 13-14 September 2006, Stockholm, Sweden.  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6366
5.

国際会議録
国際会議録
5. Growth and Characterization of Ge1-xSnx Layers for High Mobility Tensile-Strained Ge Channels of CMOS Devices
O. Nakatsuka ; Y. Shimura ; S. Takeuchi ; N. Tsutsui ; S. Zaima
出版情報: PRICM 7 : selected peer review papers from the seventh Pacific Rim International Conference on Advanced Materials and Processing, August 2-6, 2010, Cairns, Australia.  pp.1788-1791,  2010.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 654-656
6.

国際会議録
国際会議録
6. Growth of Single-Phase 2H-SiC Layers by Vapor-Liquid-Solid Process
M. Imade ; S. Takeuchi ; M. Uemura ; M. Yoshimura ; Y. Kitaoka
出版情報: Silicon carbide and related materials 2009 : selected peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2009, Nurnberg, Germany, October 11-16, 2009.  pp.45-48,  2010.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 645-648
7.

国際会議録
国際会議録
7. Vapor Phase Doping with N-type Dopant into Silicon by Atmospheric Pressure Chemical Vapor Deposition
S. Takeuchi ; N. Nguyen ; F.E. Leys ; R. Loo ; T. Conard
出版情報: SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices.  pp.495-502,  2008.  Pennington, NJ.  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 16(10)
8.

国際会議録
国際会議録
8. Local Strain Distribution in AlN Thick Films Analyzed by X-Ray Microdiffraction
D.T. Khan ; S. Takeuchi ; Y. Nakamura ; H. Miyake ; K. Hiramatsu
出版情報: THERMEC 2013 : Selected, peer reviewed papers from the 8th International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS Processing, Fabrication, Properties, Applications, December 2-6, 2013, Las Vegas, USA.  pp.2016-2021,  2014.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 783-786
9.

国際会議録
国際会議録
9. Evaluation of DiMethylAminoGermaniumTetraChloride as a novel Carbon-Dopant and Germanium Precursor for Germanium and Silicon Germanium Chemical Vapor Deposition
F.E. Leys ; C. Liu ; X. Shi ; B. Lamare ; S. Takeuchi
出版情報: SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices.  pp.159-162,  2008.  Pennington, NJ.  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 16(10)
10.

国際会議録
国際会議録
10. Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography
Y. Kishikawa ; M. Kawashima ; A. Ohkubo ; Y. Iwasaki ; S. Takeuchi ; M. Yoshii ; T. Honda
出版情報: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6520