Advances in process overlay: alignment solutions for future technology nodes
- 著者名:
H. Megens ( ASML (Netherlands) ) R. van Haren ( ASML (Netherlands) ) S. Musa ( ASML (Netherlands) ) M. Doytcheva ( ASML (Netherlands) ) S. Lalbahadoersing ( ASML (Netherlands) ) M. van Kemenade ( ASML (Netherlands) ) H. Lee ( ASML (Netherlands) ) P. Hinnen ( ASML (Netherlands) ) F. van Bilsen ( ASML (Netherlands) ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XXI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6518
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- 言語:
- 英語
- 請求記号:
- P63600/6518
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |