1.

国際会議録
国際会議録
1. Pushing releability limits in SiO2: an extension to gate oxide scaling
Roy,P.K. ; Chen,Y. ; Chetlur,S.
出版情報: Photonics 2000 : International Conference on Fiber Optics and Photonics : 18-20 December 2000, Calcutta, India : proceedings.  pp.161-171,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4417
2.

国際会議録
国際会議録
2. Non-Contact Characterization of Ultrathin Dielectrics for the Gigabit Era*
Roy,P.K. ; Chacon,C. ; Ma,Y. ; Kizilyalli,I.C. ; Horner,G.S. ; Verkuil,R.L. ; Miller,T.G.
出版情報: Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.280-294,  1997.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3322
3.

国際会議録
国際会議録
3. Ultrathin oxide for sub-O.25-ｦﾌm technology in silicon ICs: impact of stacking and nitridation
Roy,P.K. ; Ma,Y.
出版情報: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.61-71,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3212
4.

国際会議録
国際会議録
4. Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology
Kizilyalli,I.C. ; Huang,R.Y. ; Hwang,D. ; Kane,B.C. ; Ashton,R. ; Kuehne,S. ; Deng,X. ; Twiford,M.S. ; Martin,E.P. ; Shuttleworth,O. ; Wittingham,K. ; Lytle,S. ; Ma,Y. ; Roy,P.K. ; Olmer,L. ; Vaidya,H. ; Li,F. ; Li,X. ; Persson,E. ; Massengale,A.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.175-181,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
5.

国際会議録
国際会議録
5. Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility
Kizilyalli,I.C. ; Abein,G. ; Chen,Z. ; Weber,G.R. ; Register,F. ; Harris,E. ; Chetlur,S. ; Higashi,G.S. ; Schofieled,M. ; Sen,S. ; Kotzias,B. ; Roy,P.K. ; Lyding,J.W. ; Hess,K.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.141-146,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
6.

国際会議録
国際会議録
6. In-line charge-trapping characterization of dielectrics for sub-0.5-ｦﾌm CMOS technologies (Invited Paper)
Roy,P.K. ; Chacon,C.M. ; Ma,Y. ; Homer,C.S.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing.  pp.70-83,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3215