1.

国際会議録
国際会議録
1. Reduced Pressure-Chemical Vapor Deposition of Ge Thick Layers on Si(001) for Microelectronics and Optoelectronics Purposes
Hartmann, J.M. ; Papon, A.M. ; Holliger, P. ; Rolland, G. ; Billon, T. ; Rouviere, M. ; Vivien, L. ; Laval, S.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.147-152,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
2.

国際会議録
国際会議録
2. Reduced Pressure-Chemical Vapor Deposition of High Ge Content (20%-55%) SiGe Virtual Substrates
Bogumilowicz, Y. ; Hartmann, J.M. ; Laugier, F. ; Rolland, G. ; Billon, T. ; Renard, V. ; Olshanetsky, E.B. ; Estibals, O. ; Kvon, Z.D. ; Portal, J.C.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.45-50,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
3.

国際会議録
国際会議録
3. 38 Structural and Electrical Properties of CVD-WNx Thin Films Deposited on High-K Materials
Allegret, S. ; Rolland, G. ; Guidotti, E. ; Yamasaki, H. ; Holliger, P. ; Pierre, F. ; Martin, F.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.324-330,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
4.

国際会議録
国際会議録
4. OMERE - A Toolkit for Space Environment
Peyrard, P.-F. ; Beutier, T. ; Serres, O. ; Chatry, C. ; Ecoffet, R. ; Rolland, G. ; Boscher, D. ; Bourdarie, S. ; Inguimbert, C. ; Calvel, P. ; Mangeret, R.
出版情報: Proceedings of the 7th European Conference on Radiation and its Effects on Components and Systems : RADECS 2003, 15-19 September 2003, Noordwijk, the Netherlands.  pp.639-642,  2004.  Noordwijk, the Netherlands.  ESA Publication Division
シリーズ名: ESA SP
シリーズ巻号: 536
5.

国際会議録
国際会議録
5. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Blin, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5133
6.

国際会議録
国際会議録
6. (9.4) 11:40 - 12:00 PM - High Ge Content Si/SiGe Heterostructures for Microelectronics and Optoelectronics Purposes
Bogumilowicz, Y. ; Hartmann, J.M. ; Damlencourt, J.F. ; Vandelle, B. ; Abbadie, A. ; Papon, A.-M. ; Rolland, G. ; Holliger, P. ; Di Nardo, C. ; Besson, P. ; Ernst, T. ; Billon, T. (CEA-LETI)
出版情報: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.665-680,  2004.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-07
7.

国際会議録
国際会議録
7. Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers
Cosnier, V. ; Dabertrand, K. ; Blonkowski, S. ; Lhostis, S. ; Zoll, S. ; Morand, Y. ; Descombes, S. ; Guillaumot, B. ; Hobbs, C. ; Rochat, N. ; Rolland, G. ; Renault, O. ; Garros, X. ; Casse, M. ; Mitard, J. ; Lehnen, P. ; Miedl, S. ; Lindner, J. ; Schumacher, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
8.

国際会議録
国際会議録
8. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Bun, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-3
9.

国際会議録
国際会議録
9. Correlation between electron and proton induced permanent degradation in a COTS optocoupler
Germanicus, R. ; Dusseau, L. ; Fesquet, I. ; Gasiot, J. ; Barde, S. ; Rolland, G. ; Ecoffet, R. ; Mion, O. ; Barillot, C. ; Calvel, P.
出版情報: Proceedings of the European Space Components Conference, ESCCON 2002, 24-27 September 2002, Toulouse, France.  pp.261-264,  2002.  Noordwijk, The Netherlands.  ESA Publications Division
シリーズ名: ESA SP
シリーズ巻号: 507
10.

国際会議録
国際会議録
10. Perforrrianee of the COROT CCD for high-accuracy photometry,
Bernardi, P. ; Lapeyrere, V. ; Buey, J.-T. ; Parisot, J. ; Schmidt, R. ; LeRuyet, B. ; Tiphene, D. ; Gilard, O. ; Rolland, G.
出版情報: Second Eddington Workshop, Stellar Structure and Habitable Planet Finding, 9-11 April 2003, Palermo, Italy.  pp.191-196,  2004.  Noordwijk, The Netherlands.  ESA Publications Division
シリーズ名: ESA SP
シリーズ巻号: 538