1.

国際会議録
国際会議録
1. (4.12) 7:58 - 8:01 PM - SIMS Depth Profiling of Band As Implants in Si1_xGex and Strained Si/Si1_xGex
Bennett, J. ; Kohli, P. ; Wise, R. ; Rodder, M. ; Yu, S. ; Cleavelin, R. ; Pas, M. ; Braithwaite, G. ; Currie, M.T. ; Lochtefeld, A. (SEMATECH)
出版情報: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.239-242,  2004.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-07
2.

国際会議録
国際会議録
2. (18.5) 11:35 - 11:55 AM - Ultra-Shallow Junction Formation in Strained Si/Sil-xGex using Flash-Assist RTA
Kohli, P. ; Wise, R. ; Braithwaite, G. ; Currie, M. T. ; Lochtefeld, A. ; Rodder, M. ; Bennett, J. ; Gostowski, M. ; Nguyen, B. ; Cleavelin, R. ; Yu, S. ; Pas, M. ; Gelpey, J. ; McCoy, S. ; Campion, A. ; Chaumont, M. (SEMATECH)
出版情報: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1113-1114,  2004.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-07
3.

国際会議録
国際会議録
3. Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10ｦﾌm CMOS
Kittl, J. A. ; Hong, Q. Z. ; Yang, H. ; Yu, N. ; Rodder, M. ; Apte, P. P. ; Shiau, W. T. ; Chao, C. P. ; Breedijk, T. ; Pas, M. F.
出版情報: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.331-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 525
4.

国際会議録
国際会議録
4. Low-Temperature Formation of C54 TiSi2 By-Passing the C49 Phase: Effect of Si Crystallinity, Metallic Impurities and Applications to 0.10 ｦﾌm CMOS
Kittl, J. A. ; Gribelyuk, M. A. ; Samavedam, S. B. ; Hong, Q. Z. ; Yu, N. ; Rodder, M.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.201-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
5.

国際会議録
国際会議録
5. Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 ｦﾌm CMOS
Kittl, J. A. ; Hong, Q. Z. ; Yang, H. ; Yu, N. ; Rodder, M. ; Apte, P. P. ; Shiau, W. T. ; Chao, C. P. ; Breedijk, T. ; Pas, M. F.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.255-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
6.

国際会議録
国際会議録
6. Mechanisms of Thin Film Ti and Co Silicide Phase Formation on Deep-Sub-Micron Geometries and Their Implications and Applications to 0.18 ｦﾌm CMOS and Beyond
Kittl, J. A. ; Hong, Q. Z. ; Rodder, M.
出版情報: Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A..  pp.505-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 427