Copper Removal from Chemical Mechanical Polishing Effluent

Copper Removal from Chemical Mechanical Polishing Effluent

著者名:

Riley, C. ( USFilter Recovery Services, Inc. )
Filson, J. ( USFilter Recovery Services, Inc. )
Mendicino, L. ( Motorola )
Brown, P.T. ( Motorola )

掲載資料名:

Environmental issues in the electronics and semiconductor industries : proceedings of the third international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2000-7

発行年:

2000

開始ページ:

174

終了ページ:

184

総ページ数:

11

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772723 [1566772729]

言語:

英語

請求記号:

E23400/2000-7

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013976
シリーズID:	PA00000028
会議名:	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
回次:	3rd ; 197th
会議開催地:	Toronto, Ontario, Canada
会議開催年:	2000.05.00

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