1.

国際会議録
国際会議録
1. 23 Ni-based silicides: material issues for advanced CMOS applications
Kittl, J.A. ; Lauwers, A. ; Chamirian, O. ; Van Dal, M ; Akheyar, A. ; Richard, O. ; Lisoni, J.G. ; De Potter, M ; Lindsay, R. ; Moex, K.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.177-182,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-14
2.

国際会議録
国際会議録
2. 20 Sidewall grooving on narrow CoSi2 lines
Chamirian, O. ; de Potter, M ; Lauwers, A. ; Richard, O. ; Lindsay, R. ; Vrancken, C. ; Moex, K.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.155-160,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-14
3.

国際会議録
国際会議録
3. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
出版情報: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2002-2
4.

国際会議録
国際会議録
4. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
5.

国際会議録
国際会議録
5. Precise Determination of the Solar Helium Abundance by Helioseismology
Richard, O.
出版情報: SOHO 6/GONG 98 Workshop on Structure and Dynamics of the Interior of the Sun and Sun-like Stars : 1-4 June 1998, Boston, Massachusetts, USA.  pp.517-520,  1998.  Noordwijk, The Netherlands.  ESA Publications Division
シリーズ名: ESA SP
シリーズ巻号: 418
6.

国際会議録
国際会議録
6. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
出版情報: Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.145-152,  2003.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 747
7.

国際会議録
国際会議録
7. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5133
8.

国際会議録
国際会議録
8. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.335-342,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
9.

国際会議録
国際会議録
9. Processing Damage and Electrical Performance of Porous Dielectrics in Narrow Spaced Interconnects
Iacopi, F. ; Travaly, Y. ; Stucchi, M. ; Struyf, H. ; Peeters, S. ; Jonckheere, R. ; Leunissen, L.H.A. ; Tokei, Zs. ; Sutcliffe, V. ; Richard, O. ; Hove, M.Van ; Maex, K.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.19-24,  2004.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 812
10.

国際会議録
国際会議録
10. 5 Effect of Amorphization on Activation and Deactivation of Boron in Source/Drain, Channel and Poly Gate
Pawlak, B.J. ; Duffy, R. ; Janssens, T. ; Vandenorst, W. ; Seven, S. ; Richard, O. ; Benedetti, A. ; Eyben, P. ; Colombeau, B. ; Cowern, N.E.B. ; Camilla-Castillo, R.A. ; Jones, K.S. ; Aboy, M.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.43-49,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05