*CHARACTERIZATION AND CONTROL OF WAFER CHARGING EFFECTS DURING HIGH-CURRENT ION IMPLANTATION
- 著者名:
Current, M.I. Lucaszek, W. Dixon, W. Vella, M.C. Messick, C. Shideler, J. Reno, S. - 掲載資料名:
- Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1994-9
- 発行年:
- 1994
- 開始ページ:
- 49
- 終了ページ:
- 58
- 総ページ数:
- 10
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770415 [1566770416]
- 言語:
- 英語
- 請求記号:
- E23400/941386
- 資料種別:
- 国際会議録
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