1.

国際会議録
国際会議録
1. 0.35-ｦﾌm i-line attenuated phase-shift mask(PSM)repair by focused-ion-beam technology
Raphaelian,M.L. ; Ellis,M. ; Ferranti,D.C. ; Stewart,D.K.
出版情報: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.383-397,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3096
2.

国際会議録
国際会議録
2. Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks
Casey,J.D.,Jr. ; Doyle,A.F. ; Stewart,D.K. ; Ferranti,D.C. ; Raphaelian,M.L. ; Morgan,J.C.
出版情報: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.487-497,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3236
3.

国際会議録
国際会議録
3. Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology
Raphaelian,M.L. ; Carolan,D. ; Casey,J.D.,Jr. ; Doyle,A.F. ; Ellis,M. ; Ferranti,D.C. ; Lessing,J. ; Rose,K. ; Stewart,D.K. ; White,R.L.
出版情報: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.471-486,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3236
4.

国際会議録
国際会議録
4. Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks
Raphaelian,M.L. ; Casey,J.d. ; Doyle,A.F. ; Ferranti,D.C. ; Morgan,J.C.
出版情報: Photomask and X-Ray Mask Technology V.  pp.589-600,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3412