1.

国際会議録
国際会議録
1. Suppression Of Parasitic BJT Action In Single Pocket Thin Film Deep Sub-Micron Soi Mosfets
Din, Najeeb-ud ; Kumar, Aatish ; Dunga, Mohan V. ; Rao, V. Ramgopal ; Vasi, J.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.3-8,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
2.

国際会議録
国際会議録
2. Effective Dielectric Thickness Scaling For It High-K Gate Dielectric MOSFETs
Bhuwalka, Krishna Kumar ; Mohapatra, Nihar R. ; Narendra, Siva G. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.215-220,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
3.

国際会議録
国際会議録
3. Improvement in Gate Dielectric Quality of Ultra Thin a: SiN:H MNS Capacitors by Hydrogen Etching of the Substrate
Waghmare, Parag C. ; Patil, Samadhan B. ; Dusane, Rajiv O. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.171-176,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
4.

国際会議録
国際会議録
4. Degradation Study Of Ultra-Thin JVD Silicon Nitride MNSFETs
ManjulaRani, K.N. ; Rao, V. Ramgopal ; Vasi, J.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.209-214,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
5.

国際会議録
国際会議録
5. Polarity Dependence Of Degradation In Ultra Thin Oxide And Jvd Nitride Gate Dielectrics
Mutha, Yatin ; ManjulaRani, K.N. ; Lal, Rakesh ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.369-374,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
6.

国際会議録
国際会議録
6. Electrically Induced Junction MOSFET For High Performance Sub-50nm CMOS Technology
Dixit, Abhisek ; Dusane, Rajiv O. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.305-310,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
7.

国際会議録
国際会議録
7. Device Scaling Effects On Substrate Enhanced Degradation In Mos Transistors
Mohapatra, Nihar Ranjan ; Mahapatra, Souvik ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.287-292,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
8.

国際会議録
国際会議録
8. Effect Of Technology Scaling On Mos Transistors With High-K Gate Dielectrics
Mohapatra, Nihar R. ; Desai, Madhav P. ; Narendra, Siva G. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.133-138,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716