F. Cristiano ; E.M. Bazizi ; P.F. Fazzini ; S. Boninelli ; R. Duffy
出版情報:
Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany. pp.269-278, 2008. Aedermannsdorf, Switzerland. Trans Tech Publications
Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany. pp.333-340, 2008. Aedermannsdorf, Switzerland. Trans Tech Publications
M.J. Van Dal ; G. Vellianitis ; R. Duffy ; G. Doornbos ; B. Pawlak
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment. pp.223-234, 2008. Pennington, N.J.. Electrochemical Society
R. Duffy ; A. Heringa ; J. Loo ; E. Augendre ; S. Severi ; G. Curatola
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.19-34, 2006. Pennington, NJ. Electrochemical Society
B. J. Pawlak ; R. Duffy ; T. Hoffman ; S. Seven ; S. Feich ; P. Eyhen ; B. Van Daele ; W. Vandervorst ; R. J. Lander
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment. pp.351-364, 2007. Pennington, NJ. Electrochemical Society
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