Qui, J. ; Gunshor, R.L. ; Kobayashi, M. ; Menke, D.R. ; Qian, Q.-D. ; Li, D. ; Otsuka, N.
出版情報:
Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A.. pp.115-120, 1990. Pittsburgh, Pa.. Materials Research Society
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.93-100, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA. pp.144-152, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology X. pp.847-854, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1234-1241, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Chiou, S.Y. ; Lei, H. ; Liu, W.J. ; Chu, M.J. ; Chiang, D. ; Tuan, S. ; Hong, C.-L. ; Chang, M. ; Chen, J.-H. ; Chan, K.K. ; Qian, Q.-D. ; Cai, L. ; Pang, L.Y.
出版情報:
Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.23-34, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1085-1091, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Pang, L. ; Qian, Q.-D. ; Chan, K.K. ; Morikawa, Y. ; Nishiguchi, M. ; Hayashi, N.
出版情報:
Photomask and Next-Generation Lithography Mask Technology IX. pp.614-621, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
出版情報:
Photomask and Next-Generation Lithography Mask Technology IX. pp.622-629, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
Pang, L. ; Qian, Q.-D. ; Chan, K.K. ; Toyama, N. ; Hayashi, N.
出版情報:
Photomask and Next-Generation Lithography Mask Technology IX. pp.652-659, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
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