1.

国際会議録
国際会議録
1. Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]
Lee, -W. S. ; Leunissen, A. H. L. ; Van de Kerhove, J. ; Philipsen, V. ; Jonckheere, R. ; Lee, -J. S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810U-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
2.

国際会議録
国際会議録
2. Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
Konishi, T. ; Kojima, Y. ; Okuda, Y. ; Philipsen, V. ; Leunissen, A. H. L. ; Van Look, L.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810S-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
3.

国際会議録
国際会議録
3. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]
Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.
出版情報: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810T-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6281
4.

国際会議録
国際会議録
4. Determining the transfer function of a mask fabrication process
Leunissen, P. L. H. A. ; Philipsen, V. ; Jonckheere, R. M.
出版情報: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.36-45,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5504
5.

国際会議録
国際会議録
5. OPC aware mask and wafer metrology
Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.
出版情報: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.175-181,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4764
6.

国際会議録
国際会議録
6. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
出版情報: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6152
7.

国際会議録
国際会議録
7. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
出版情報: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6283
8.

国際会議録
国際会議録
8. Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
出版情報: Optical Microlithography XIX.  pp.61541E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
9.

国際会議録
国際会議録
9. Validity of the Hopkins approximation in simulations of hyper NA(NA>l) line-space structures for an attenuated PSM mask [6154-16]
Erdmann, A. ; Citarella, G. ; Evanschitzky, P. ; Schermer, H. ; Philipsen, V. ; De Bisschop, P.
出版情報: Optical Microlithography XIX.  pp.61540g-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
10.

国際会議録
国際会議録
10. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992