1.

国際会議録
国際会議録
1. Performance,standby power,and manufacturability trade-off in transistor design consideration for 0.25-ｦﾌm technology
Bhat,N. ; Chuang,H. ; Tsui,P. ; Woodruff,R. ; Grant,J. ; Kruth,R. ; Perera,A.H. ; Poon,S. ; Collins,S. ; Dyer,O. ; Misra,V. ; Yang,I. ; Venkatesan,S. ; Gilbert,P.V.
出版情報: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.167-174,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3506
2.

国際会議録
国際会議録
2. High-performance 0.25-ｦﾌm CMOS technology for fast SRAMs
Hayden,J.D. ; McNelly,T.F. ; Perera,A.H. ; Pfiester,J.R. ; Subramanian,C.K. ; Thompson,M.A.
出版情報: Microelectronic Device and Multilevel Interconnection Technology II.  pp.148-163,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2875